I-Magnetron sputtering coating yindlela entsha yokugquma umphunga, xa kuthelekiswa nendlela yokwaleka yangaphambili yokuba ngumphunga, izibonelelo zayo kwiinkalo ezininzi ziphawuleka kakhulu.Njengetekhnoloji evuthiweyo, i-magnetron sputtering isetyenziswe kwiinkalo ezininzi.
Umgaqo-siseko wokutshiza weMagnetron:
Intsimi yemagnethi ye-orthogonal kunye nentsimi yombane yongezwa phakathi kwepali ekujoliswe kuyo (i-cathode) kunye ne-anode, kunye negesi ye-inert efunekayo (ngokuqhelekileyo i-Ar gas) izaliswe kwigumbi eliphezulu le-vacuum.Umazibuthe osisigxina wenza i-250-350 gaus intsimi yamagnetic kumphezulu wento ekujoliswe kuyo, kwaye intsimi ye-orthogonal electromagnetic iqulunqwe kunye nentsimi yombane ephezulu.Ngaphantsi kwefuthe lentsimi yombane, i-ionization yegesi ye-Ar ibe yi-ion elungileyo kunye nee-electron, ijolise kwaye inoxinzelelo oluthile olubi, ukusuka ekujoliswe kuyo kwipali ngenxa yempembelelo yemagnethi kunye negesi esebenzayo ye-ionization yokwanda kwamathuba, yenza iplasma ephezulu yoxinaniso cathode, Ar ion phantsi kwentshukumo yamandla elorentz, khawulezisa ukubhabha ukuya kwindawo ekujoliswe kuyo, ukubhobhoza indawo ekujoliswe kuyo ngesantya esiphezulu, iiathom ezichithakeleyo kwindawo ekujoliswe kuyo zilandela umgaqo woguqulo olukhawulezileyo kwaye zibhabhe umke kwindawo ekujoliswe kuyo ngekinetic ephezulu. amandla kwifilimu yokubeka i-substrate.
I-Magnetron sputtering yohlulwe ngokubanzi ibe ziindidi ezimbini: i-DC sputtering kunye ne-RF sputtering.Umgaqo-nkqubo we-DC sputtering wezixhobo zilula, kwaye isantya sikhawuleza xa sitshiza isinyithi.Ukusetyenziswa kwe-RF sputtering kubanzi ngakumbi, ukongeza kwizixhobo eziqhubayo zokutshiza, kodwa kunye nokutshiza izixhobo ezingaqhubekiyo, kodwa kunye nokulungiswa kokutshiza okusebenzayo kweeoksidi, ii-nitrides kunye ne-carbides kunye nezinye izinto ezihlanganisiweyo.Ukuba ubuninzi be-RF buyanda, iba yi-microwave plasma sputtering.Okwangoku, i-electron cyclotron resonance (ECR) uhlobo lwe-microwave plasma sputtering luqhele ukusetyenziswa.
Imathiriyeli ekujoliswe kuyo yokwaleka iMagnetron:
Intsimbi yokugalela imathiriyeli, izinto zokugquma ingxubevange yokwaleka, imathiriyeli yokwaleka yeseramic, ibhoride iithagethi zokugalela izinto ekujoliswe kuzo, imathiriyeli yethagethi yecaramic sputtering, imathiriyeli ye-fluoride ceramic sputtering, imathiriyeli ye-nitride ceramic sputtering, ithagethi ye-oxide ye-ceramic, i-selenide yethagethi yethagethi ye-sputtering. Ithagethi yethagethi ye-silicide ceramic sputtering, imathiriyeli yesulfide ceramic sputtering, Telluride ceramic sputtering target, enye ithagethi yekeramic, enye ithagethi yekhromium-doped silicon oxide ceramic ceramic (CR-SiO), indium phosphide target (InP), lead arsenide target (PbAs), indium arsenide ekujoliswe kuko (InAs).
Ixesha lokuposa: Aug-03-2022