Ngokunyuka kwemfuno yemarike, iintlobo ezininzi ngakumbi nangakumbi zokujoliswa kwe-sputtering zihlaziywa rhoqo.Ezinye ziqhelekile kwaye ezinye aziqhelanga kubathengi.Ngoku, singathanda ukwabelana nawe ukuba zeziphi iintlobo zeethagethi ze-magnetron sputtering.
Ithagethi yokutshiza inezi ntlobo zilandelayo: ithagethi yokwaleka kwesinyithi, ithagethi yokwaleka ialloyi, ithagethi yokugalela ingxubevange, ithagethi yokutshiza yeceramic, ithagethi yokutshiza ye-boride ceramic, ithagethi yokutshiza ye-carbide ceramic, ithagethi yokutshiza ye-fluoride ceramic, ithagethi ye-nitride ceramic sputtering, ithagethi ye-oxide ye-ceramic, ithagethi ye-selenide ye-ceramic. , ithagethi ye-silicide ceramic sputtering, ithagethi yesulfide ceramic sputtering, telluride ceramic sputtering target, ezinye iithagethi zekeramic, Chromium doped silicon oxide ceramic target (CR SiO), indium phosphide target (INP), lead arsenide target (pbas), indium arsenide target (InAs ).
I-Magnetron sputtering yohlulwe ngokubanzi ibe ziindidi ezimbini: i-DC sputtering kunye ne-RF sputtering.Umgaqo-nkqubo we-DC sputtering wezixhobo zilula, kwaye izinga layo likwakhawuleza xa kutshiza isinyithi.I-RF sputtering isetyenziswa ngokubanzi.Ukongeza kwi-sputtering data conductive, inokuphinda ikhuphe idatha engasebenziyo.Kwangaxeshanye, ithagethi yokutshiza iphinda ikhuphe i-reactive sputtering ukulungiselela i-compound data efana ne-oxides, i-nitrides kunye ne-carbides.Ukuba iRF frequency iyanda, iya kuba yi microwave plasma sputtering.Okwangoku, i-electron cyclotron resonance (ECR) i-microwave plasma sputtering iqhele ukusetyenziswa.
Ixesha lokuposa: May-18-2022