Wamkelekile kwiiwebhusayithi zethu!

I-Magnetron Sputtering Principles ye-Sputtering Target

Abasebenzisi abaninzi kufuneka ukuba bevile ngemveliso yethagethi yokutshiza, kodwa umthetho-siseko wokutshiza ekujoliswe kuwo kufuneka ube ungaqhelekanga.Ngoku, umhleli weIzinto eziTyebileyo eziZodwa (RSM) wabelana ngemigaqo yemagnetron yokugalela ekujoliswe kuyo.

 https://www.rsmtarget.com/

Intsimi yemagnethi ye-orthogonal kunye nentsimi yombane yongezwa phakathi kwe-electrode ekujoliswe kuyo (i-cathode) kunye ne-anode, igesi ye-inert efunekayo (ngokubanzi i-Ar gas) izaliswe kwigumbi eliphezulu le-vacuum, imagnethi esisigxina yenza i-250 ~ 350 intsimi yemagnethi yeGauss umphezulu wedatha ekujoliswe kuyo, kunye nentsimi ye-orthogonal ye-electromagnetic yenziwe nge-high-voltage yombane.

Ngaphantsi kwefuthe lentsimi yombane, i-Ar gas i-ionized ibe yi-ion kunye nee-electron.Umbane othile ongalunganga ophezulu wongezwa kwindawo ekujoliswe kuyo.Impembelelo yamandla kazibuthe kwii-electron ezikhutshwe kwipali ekujoliswe kuyo kunye namathuba e-ionization yokwanda kwegesi yokusebenza, okwenza i-plasma ephezulu kufuphi ne-cathode.Ngaphantsi kwempembelelo ye-Lorentz force, i-Ar ions ikhawuleza ukuya kwindawo ekujoliswe kuyo kwaye ibhobhoze indawo ekujoliswe kuyo ngesantya esiphezulu kakhulu, ii-athomu ezichithakeleyo kwindawo ekujoliswe kuyo zilandela umgaqo wokuguqulwa kwesantya kwaye zibhabhe zimke kwindawo ekujoliswe kuyo ukuya kwi-substrate enamandla amakhulu e-kinetic. ukufaka iifilimu.

I-Magnetron sputtering yohlulwe ngokubanzi ibe ziindidi ezimbini: i-Tributary sputtering kunye ne-RF sputtering.Umgaqo-siseko wezixhobo zokutshiza i-tributary sputtering ulula, kwaye isantya saso sikwakhawuleza xa kutshiza isinyithi.I-RF sputtering isetyenziswa ngokubanzi.Ukongeza kwizixhobo zokuqhuba, iyakwazi ukutshiza izinto ezingaqhubekiyo.Kwangaxeshanye, iphinda iqhube i-sputtering esebenzayo ukulungiselela izixhobo ze-oxides, i-nitrides, i-carbides kunye nezinye iikhompawundi.Ukuba i-RF frequency yonyusiwe, iya kuba yi-microwave sputtering yeplasma.Ngoku, i-electron cyclotron resonance (ECR) i-microwave plasma sputtering iqhele ukusetyenziswa.


Ixesha lokuposa: May-31-2022