Njengoko sonke sisazi, iindlela eziqhele ukusetyenziswa kwi-vacuum coating kukuphefumla nge-vacuum kunye nokutshiza kwe-ion.Yintoni umahluko phakathi transpiration ukutyabeka kunye sputtering coating Abaninziabantu nemibuzo enjalo.Makhe sabelane nawe ngomahluko phakathi kokwaleka kwe-transpiration kunye ne-sputtering coating
Vacuum transpiration film kukufudumeza idata ukuba idlule kwiqondo lobushushu elisisigxina ngokusebenzisa ukufudumeza ukumelana okanye umqa we-electron kunye ne-laser shelling kwindawo eneqondo le-vacuum elingekho ngaphantsi kwe-10-2Pa, ukuze amandla okungcangcazela ashushu kwiimolekyuli okanye iiathom ezikwidatha zigqithisa amandla okubopha kumphezulu, ukuze iiathom ezininzi okanye iiathom zidlule okanye zinyuke, kwaye zibeke ngokuthe ngqo kwi-substrate ukwenza ifilimu.Ion sputtering coating isebenzisa intshukumo ephezulu ye-remonstrance yeeyoni ezilungileyo eziveliswa kukukhutshwa kwerhasi phantsi kwesiphumo sommandla wombane ukubhobhoza ekujoliswe kuko njengecathode, ukuze iiathomu okanye iimolekyuli ezikuloo nto ijoliswe kuyo ibaleke kwaye idiphozithelwe kumphezulu womsebenzi ocandiweyo ukuba wenziwe. ifilimu efunekayo.
Eyona ndlela isetyenziswa ngokuqhelekileyo yokugquma i-vacuum transpiration iyindlela yokumelana nokufudumeza.Iingenelo zayo ziyisakhiwo esilula somthombo wokufudumeza, ixabiso eliphantsi kunye nokusebenza kakuhle.Ukungalungi kwayo kukuba ayifanelekanga kwiintsimbi eziphikisayo kunye neendaba ezichasene nobushushu obuphezulu.Ukufudumeza kwe-electron beam kunye nokufudumeza kwe-laser kunokoyisa ukungalungi kokumelana nokufudumala.Kubushushu be-electron beam, i-electron beam egxininisiweyo isetyenziselwa ukufudumeza ngokuthe ngqo idatha egciniweyo, kwaye amandla e-kinetic we-electron beam abe ngamandla obushushu ukwenza ukutshintshwa kwedatha.Ukufudumala kweLaser kusebenzisa i-laser yamandla aphezulu njengomthombo wokufudumeza, kodwa ngenxa yeendleko eziphezulu ze-laser yamandla aphezulu, inokusetyenziswa kuphela kwinani elincinci leelabhoratri zophando.
Isakhono sokutshiza sahlukile kwisakhono sevacuum transpiration.I-Sputtering ibhekisa kwisenzeko sokuba amasuntswana ahlawuliweyo abuyele kumphezulu (ithagethi) yomzimba, ukuze iiathomu eziqinileyo okanye iiathomu zikhutshwe kumphezulu.Uninzi lwamasuntswana akhutshiweyo yiathom, edla ngokubizwa ngokuba ziiathom eziphothiweyo.Amasuntswana athathiweyo asetyenziselwa iithagethi ze-shelling ingaba yi-electron, i-ion okanye amasuntswana angathathi hlangothi.Ngenxa yokuba ii-ion zilula ukufumana amandla e-kinetic afunekayo phantsi kwentsimi yombane, ii-ion zikhethwa kakhulu njengamaqhekeza.
Inkqubo ye-sputtering isekelwe ekuphumeni okukhanyayo, oko kukuthi, ii-ion zokutshiza zivela kwi-gas discharge.Izakhono ezahlukeneyo zokutshiza zineendlela ezahlukeneyo zokukhupha ukukhanya.I-DC diode sputtering isebenzisa ukukhupha ukukhanya kwe-DC;I-Triode sputtering kukukhupha okukhanyayo okuxhaswa yi-cathode eshushu;I-RF sputtering isebenzisa ukukhutshwa kokukhanya kweRF;I-Magnetron sputtering kukukhupha okukhanyayo okulawulwa yi-annular magnetic field.
Xa kuthelekiswa ne-vacuum transpiration coating, i-sputtering coating ineengenelo ezininzi.Ukuba nayiphi na into inokuchaphazwa, ngakumbi izakhi kunye neekhompawundi ezinendawo ephezulu yokunyibilika kunye noxinzelelo lomphunga oluphantsi;Ukunamathela phakathi kwefilimu ene-sputtered kunye ne-substrate kulungile;Ukuxinana kwefilimu ephezulu;Ubukhulu befilimu bunokulawulwa kwaye ukuphindaphinda kulungile.Ukungalungi kukuba izixhobo zinzima kwaye zifuna izixhobo eziphezulu zombane.
Ukongeza, indibaniselwano yendlela yokuphefumula kunye nendlela yokutshiza yi-ion plating.Iingenelo zale ndlela kukunamathela okuqinileyo phakathi kwefilimu kunye ne-substrate, izinga eliphezulu lokubeka kunye noxinzelelo oluphezulu lwefilimu.
Ixesha lokuposa: May-09-2022