Njengoko sonke sisazi, i-vacuum evaporation kunye ne-ion sputtering ziqhele ukusetyenziswa kwi-vacuum coating.Uthini umahluko phakathi kokwalekwa okuphuphumayo kunye nokwaleka kokutshiza?Okulandelayo, iingcali zobugcisa ezivela kwi-RSM ziya kubelana nathi.
Vacuum evaporation ukutyabeka kukufudumeza imathiriyeli ukuba abe ngumphunga ukuya kubushushu obuthile ngokusebenzisa ukufudumeza ukuxhathisa okanye umqa we-electron kunye ne-laser bombardment kwindawo eneqondo le-vacuum elingekho ngaphantsi kwe-10-2Pa, ukuze amandla okungcangcazela kwe-thermal yeemolekyuli okanye iiathom kwizinto eziphathekayo zidlula amandla okubopha kumphezulu, ukwenzela ukuba inani elikhulu leemolekyuli okanye iiathomu zijike zibe ngumphunga okanye i-sublimate, kwaye zigqithise ngokuthe ngqo kwi-substrate ukwenza ifilimu.I-ion sputtering coating isebenzisa intshukumo enesantya esiphezulu seeyoni ezilungileyo eziveliswa kukukhutshwa kwerhasi phantsi kwesenzo sommandla wombane ukubhobhoza ekujoliswe kuko njengecathode, ukuze iiathomu okanye iimolekyuli ezikujoliso zibaleke kwaye zidlule kumphezulu womsebenzi ocandiweyo ukuba wenze. ifilimu efunekayo.
Eyona ndlela isetyenziswa ngokuqhelekileyo i-vacuum evaporation coating yi-resistance heat, enenzuzo yesakhiwo esilula, ixabiso eliphantsi kunye nokusebenza kakuhle;Ukungalungi kukuba ayifanelekanga kwiintsimbi eziphikisayo kunye nezixhobo zedielectric ezichasene nobushushu obuphezulu.Ukufudumeza kwe-electron beam kunye nokufudumeza kwe-laser kunokoyisa iintsilelo zokumelana nokufudumeza.Kubushushu be-electron beam, umqadi we-electron ogxininisiweyo usetyenziselwa ukufudumeza ngokuthe ngqo izinto eziqhubhiweyo, kwaye amandla ekinetic we-electron beam aba ngamandla obushushu, okwenza izinto zibe ngumphunga.Ukufudumeza kweLaser kusebenzisa i-laser yamandla aphezulu njengomthombo wokufudumeza, kodwa ngenxa yeendleko eziphezulu zelaser yamandla aphezulu, inokusetyenziswa kuphela kwiilabhoratri zophando ezimbalwa okwangoku.
Itekhnoloji yokutshiza yahlukile kwitekhnoloji yokufunxa umphunga.“Ukutshiza” kubhekiselele kwinto yokuba amasuntswana atshajisiweyo abhobhoze umphezulu oqinileyo (ekujoliswe kuko) aze enze iiathom eziqinileyo okanye iimolekyuli zidubule ukusuka phezulu.Uninzi lwamasuntswana akhutshiweyo akwimeko yeatom, edla ngokubizwa ngokuba ziiathom eziphothiweyo.Iingqungquthela ezitshisiweyo ezisetyenziselwa ukubhobhoza ekujoliswe kuzo zingaba yi-electron, i-ion okanye iincinci ezingathathi hlangothi.Ngenxa yokuba ii-ion zilula ukukhawuleza phantsi kwebala lombane ukuze zifumane amandla e-kinetic afunekayo, uninzi lwazo zisebenzisa i-ion njengamasuntswana aqhunyiweyo.Inkqubo yokutshiza isekelwe ekuphumeni okukhanyayo, oko kukuthi, ii-ion zokutshiza zivela ekukhutshweni kwegesi.Iitekhnoloji ezahlukeneyo zokutshiza zisebenzisa iindlela ezahlukeneyo zokukhupha ukukhanya.I-DC diode sputtering isebenzisa ukukhupha ukukhanya kwe-DC;I-Triode sputtering kukukhupha okukhanyayo okuxhaswa yi-cathode eshushu;I-RF sputtering isebenzisa ukukhutshwa kokukhanya kweRF;I-Magnetron sputtering kukukhupha okukhanyayo okulawulwa yi-annular magnetic field.
Xa kuthelekiswa ne-vacuum evaporation coating, ukutyabeka kwe-sputtering kuneengenelo ezininzi.Umzekelo, nayiphi na into inokutshizwa, ngakumbi izakhi kunye neekhompawundi ezineqondo eliphezulu lokunyibilika kunye noxinzelelo lomphunga oluphantsi;Ukunamathela phakathi kwefilimu ene-sputtered kunye ne-substrate kulungile;Ukuxinana kwefilimu ephezulu;Ubukhulu befilimu bunokulawulwa kwaye ukuphindaphinda kulungile.Ukungalungi kukuba izixhobo zinzima kwaye zifuna izixhobo eziphezulu zombane.
Ukongeza, indibaniselwano yendlela yokuphuphuma komphunga kunye nendlela yokutshiza yi-ion plating.Iingenelo zale ndlela kukuba ifilimu efunyenweyo inokubambelela ngokuqinileyo kunye ne-substrate, izinga eliphezulu lokubeka kunye nobuninzi befilimu.
Ixesha lokuposa: Jul-20-2022