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I-ZrSi Alloy Sputtering Target High Purity Thin Film PVD Coating Custom Yenziwe

Zirconium silicon

Inkcazelo emfutshane:

Udidi

I-alloy Sputtering Target

Ifomula yeMichiza

ZrSi

Ukuqamba

Zirconium silicon

Ubunyulu

99.5%, 99.7%, 99.9%,

Ubume

Iipleyiti, iiKholamu ekuJoliswe kuzo, ii-arc cathodes, ezenzelwe wena

Inkqubo yeMveliso

Ukunyibilika kweVacuum, PM

Ubungakanani obukhoyo

L≤200mm,W≤200mm


Iinkcukacha zeMveliso

Iithegi zeMveliso

Ithagethi ye-Zirconium Silicon sputtering yenziwe ngendlela yokunyibilika kwevacuum kunye nesinyithi samandla.

I-Zirconium ekhoyo inokuphucula ubulukhuni kunye nokuziphatha kokumelana nokubola.

I-Zirconium Silicon ijolise kwi-low conductivity yombane, kwaye inokunciphisa uxinzelelo oluseleyo, oluya kuphucula ukuzinza kweengubo kunye nokwandisa ubomi benkonzo.Iingubo zokwaleka zingasetyenziswa kwiglasi ye-E ephantsi ngenxa yokungaguquguquki kwayo okuphezulu kunye nokuziphatha kokumelana nomhlwa.

Xa kuthelekiswa ne-Silicon ecocekileyo, ukucoceka okuphezulu kweZirconium Silicon sputtering targets kunokuphucula kakhulu ukuxhathisa ukuxhatshazwa kwengubo egciniweyo ngamaxesha angama-4-6.

Ke ngoko, iZr-Si iyafumaneka kwizicelo ezininzi ezisebenzayo.

Izinto ezityebileyo eziZodwa nguMvelisi we-Sputtering Target kwaye unokuvelisa iZirconium Silicon Sputtering Materials ngokweenkcukacha zabaThengi.Ukuze ufumane inkcazelo engakumbi, nceda uqhagamshelane nathi.


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