Tungsten Silicide
Tungsten Silicide
I-Tungsten silicidi ye-WSi2 isetyenziswa njengesixhobo sokutshatyalaliswa kombane kwi-microelectronics, i-shunting kwiingcingo ze-polysilicon, i-anti-oxidation i-coating kunye ne-resistance wire coating.I-silicid ye-Tungsten isetyenziswe njengento yoqhagamshelwano kwi-microelectronics, kunye ne-resistiveivity ye-60-80μΩcm.Yenziwa kwi-1000°C.Ngokuqhelekileyo isetyenziselwa i-shunt yemigca ye-polysilicon ukunyusa i-conductivity yayo kunye nokunyusa isantya somqondiso.Umaleko we-Silicide we-tungsten unokulungiswa ngokubeka umphunga wekhemikhali, njengokubeka umphunga.Sebenzisa i-monosilane okanye i-dichlorosilane kunye ne-tungsten hexafluoride njengegesi ekrwada.Ifilimu efakwe kwi-non-stoichiometric kwaye idinga ukuba i-annealing iguqulwe ibe yifom ye-stoichiometric ehamba phambili.
I-Tungsten silicide ingathatha indawo yefilimu ye-tungsten yangaphambili.I-Tungsten silicide ikwasetyenziswa njengomaleko womqobo phakathi kwesilicon kunye nezinye isinyithi.
I-Tungsten silicide nayo ixabiseke kakhulu kwiinkqubo ze-microelectromechanical, phakathi kwayo i-tungsten silicide isetyenziswa kakhulu njengefilimu ebhityileyo yokwenza ii-microcircuits.Ngenxa yale njongo, ifilimu ye-silicid ye-tungsten ingaba yi-plasma-etched usebenzisa, umzekelo, i-silicide.
| INTO | Ukwakhiwa kweekhemikhali | |||||
| Isiqalelo | W | C | P | Fe | S | Si |
| Umxholo(wt%) | 76.22 | 0.01 | 0.001 | 0.12 | 0.004 | Ibhalansi |
Izinto eziTyebileyo eziZodwa zisebenza ngokukhethekileyo kuMveliso weThagethi yeSputtering kwaye inokuvelisa iTungsten Silicide Sputtering Materials ngokwemigaqo yabaThengi.Ukuze ufumane inkcazelo engakumbi, nceda uqhagamshelane nathi.
