Wamkelekile kwiiwebhusayithi zethu!

I-AlTa Sputtering Ithagethi ePhakamileyo Ukusulungeka kweFilimu yePVD eNcinciweyo eyenziwe ngokweSiko

Aluminiyam-Tantalum

Inkcazelo emfutshane:

Udidi

I-alloy Sputtering Target

Ifomula yeMichiza

AlTa

Ukuqamba

Aluminiyam-Tantalum

Ubunyulu

99.9%, 99.95%, 99.99%

Ubume

Iipleyiti, iiKholamu ekuJoliswe kuzo, ii-arc cathodes, ezenzelwe wena

Inkqubo yeMveliso

Ukunyibilika kweVacuum, PM

Ubungakanani obukhoyo

L≤200mm,W≤200mm


Iinkcukacha zeMveliso

Iithegi zeMveliso

Iithagethi zilungiswa ngokuxuba i-Aluminiyam kunye ne-Tantalum powders okanye i-vacuum melting elandelwa kukuxinaniswa koxinano olupheleleyo.Iimathiriyeli ezidityanisiweyo zikhethwa ngokuzithandela kwaye zenziwe ngendlela efunwayo.

Ithagethi ye-Aluminium Tantalum sputtering inobunyulu obuphezulu, i-microstructure ene-homogeneous kunye ne-conductivity egqwesileyo.Isetyenziswa kakhulu ekuyilweni kweefilimu ezibhityileyo kushishino lokubonisa iipaneli ezisicaba.I-Aluminium Tantalum nayo inokongezwa ukuvelisa ukusebenza okuphezulu kwe-Titanium alloy ukuphucula ukufaneleka kwayo kobushushu obuphezulu.

Umxholo ongcolileyo we-Al-Ta alloy

ukwakheka

Umxholo(%)

Ta

Fe

Si

C

O

AlTa60

55.0~65.0

≤0.05

≤0.02

≤0.01

≤0.05

AlTa70

65.0~75.0

≤0.05

≤0.02

≤0.01

≤0.05

Izinto eziTyebileyo eziZodwa zisebenza ngokukhethekileyo kuMveliso weThagethi yeSputtering kwaye inokuvelisa iAluminium Tantalum Sputtering Materials ngokwemigaqo yabaThengi.Iimveliso zethu zineempawu ezigqwesileyo zoomatshini, ubume obufanayo, umphezulu ogudisiweyo ngaphandle kokwahlulwa, iipores okanye iintanda.Ukuze ufumane inkcazelo engakumbi, nceda uqhagamshelane nathi.


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